self aligned photoresist process是什么意思

网络释义

用法例句

In this passage,the steady photoetching technology of BP-212 positive photoresist is researched.

本文分别以玻璃片和AAO模板为基底,使用BP-212型紫外正性光刻胶,进行光刻工艺条件的研究,找到了在本实验条件下的稳定光刻工艺。

A method of simulating and optimizing lithographic process parameters is proposed based on the concept of effective time difference.

通过引入有效时差的概念 ,提出了一种可模拟光刻工艺参数间的相互关系及优化光刻参数的方法。

In the process of image transfer printing in photolithography technology, It is key link to determine the location of the image plane.

在光刻工艺的图形转印过程中,像平面位置的确定是重要的环节。

The relation of IC manufacture process and lithography alignment are studied.

主要针对光刻对准特性,从单项工艺和工艺集成的角度,分析了影响光刻对准的各个主要因素,主要包括对准标记、工艺层、隔离技术等,提出了一些改善光刻对准效果的方法。

Two-spectrum Method for Measuring the Thickness of Photoresist in Lithography Techniques

双光谱法实现光刻工艺中的胶厚检测

Systematic Control Exploitation for Critical Dimension and Overlay in Photolithography Technology

光刻工艺中对线宽和套刻系统性控制的开发

Lithography Study of UV-LIGA Technology;

UV-LIGA技术光刻工艺的研究

The Optimization of the Photolithography Process for 0.35um BiCMOS Product

0.35微米BiCMOS光刻工艺参数的优化

The Study of Add Anti Reflective Coating on PHOTO Resist Bottom in Lithography

对光刻工艺中在光阻底部增加抗反射涂层（BARC）的研究

Optimization of Photolithography Process on the Fine Structure of Surface-conduction Electron-emitter Display

表面传导电子发射显示器微细结构光刻工艺的优化

Research of SU-8 Resist Lithography Using Ultraviolet Laser;

紫外激光曝光光刻SU-8胶的工艺研究

Optical properties and process of the diluted SU8 resist

改性SU8光刻胶的光学特性及其工艺

PROCESS PARAMETERS DETERMINATION OF ETCHING LITHOGRAPHY SERVO DISK BY HF SPUTTERING

利用高频溅射刻蚀光刻伺服盘工艺参数的确定

galvanoplastic screen process by laser engraving

激光雕刻[直接]电铸花网工艺

Responsible for Implant /Diffusion/ Etch/ Photo new process development, process in-line control and development.

负责注入/扩散/刻蚀/光刻新工艺的开发及在线控制。

Research of Active Carbon Adsorption to Purify Laser Sculpting Waste Gas;

活性炭吸附法治理激光工艺雕刻废气的研究

Experimental Study on Excimer Laser Electrochemical Etching Process of Silicon;

准分子激光电化学刻蚀硅工艺实验研究

Challenges on Oxide Etch with 193nm Photoresist;

193nm光阻对于绝缘体材料刻蚀工艺的挑战

Study on the Improvement of Ashing Rate of Photoresist Ashing Process with CF4 Gas;

含氟气体的去光刻胶工艺灰化率提高的研究

STUDY ON LASER GROOVING AND CHEMICAL ETCHING PROCESS FOR EWT BACK CONTACT SOLAR CELL

EWT背结电池中的激光刻槽及腐蚀工艺的研究

A new method fir producing holographic gratings for high temperature is developed in this paper.

本文提出了应用双镀层光刻法制作高温全息光栅的新工艺。

glass ,engraved or etched by any process

玻璃,经任何工艺雕刻或蚀刻