APEX system (Additive System of Photographic Exposure)是什么意思

网络释义

用法例句

Present status and progress in 193 nm exposure system in lithography;

193nm光刻曝光系统的现状及发展

Influence of defocus of exposure system on diffraction wave front of plane holographic grating;

曝光系统离焦对平面全息光栅衍射波前的影响

Measurement System of Precision Stage for E-Beam Aligner

电子束曝光系统中精密工件台的测量系统

Study of Pattern Generator for Nanometer E-beam Lithography System;

纳米级电子束曝光系统用图形发生器技术研究

The Research on Detectors Performance in the AEC of Mammography

乳腺摄影自动曝光系统的探测器性能研究

Guidelines for precision and accuracy expression for mask writing equipment

GB/T16879-1997掩模曝光系统精密度和准确度的表示准则

The E-beam Lithograpy Control System Based on VC++6.0

基于VC++6.0的电子束曝光控制系统

An experimental double-beam and double-exposure interference photolithographic system has been established.

建立了双光束双曝光干涉光刻实验系统。

Research on the distribution of ultraviolet irradiance in an integral stereolithography system

面曝光快速成形系统中紫外光辐照度分布研究

This system only measures the central spot (inside the microprism area).

这个系统仅测定中心点曝光值（微棱镜区域内）

Research on Focusing-deflection System for Nanometer-scale Electron Beam Lithography Machine;

纳米级电子束曝光机聚焦偏转系统的研究

Study on the Control System of Film Exposure Device of Medical X-ray Machine;

医用X射线机点片曝光装置控制系统研究

Study on the Design of PCB Alignment System Based on Video and Confocal;

PCB曝光机的视频共焦显微镜对准系统研究

Research of the Exposure Software for Novel Pattern Generator with DSP Chip as Key Component;

基于DSP的图形发生器系统的曝光软件研究

The Application of the Regulator LTM4607 in the Solar Photovoltaic Aeration Systems

LTM4607稳压器在太阳能光伏曝气系统中的应用

This camera has 2 types of exposure metering systems: center-weighted average metering and spot metering.

本相机有两种曝光测定系统：中央偏重测光和单点测光模式。

needle-zero semiautomatic camera

追针式半自动相机﹝指有测光系统辅助调校曝光值的相机﹞

Monica Lewinski became a persona non grata, at the White House, after her indiscretions with the President became known.

吕文斯基和美国总统的不伦关系曝光后，变成不受欢迎人物。

High efficiency light reflecting system and diffusion foil assure95% or more light evenness.

·精心设计的光源反射系统再结合本机配的曝光散光片装置，从而使晒版光均匀度高达95%上。

Exposure,radiographic exposure

曝光,射线照相曝光